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Optimization on benzocyclobutene-based CMUT fabrication with an inverse structure
Li, Zhenhao1; Na, Shuai1; Chen, Albert I. H.1; Wong, Lawrence L. P.1; Sun, Zhendong3; Liu, Ping4; Yeow, John T. W.1,2
2018-10-01
Source PublicationSENSORS AND ACTUATORS A-PHYSICAL
ISSN0924-4247
Volume281Pages:1-8
AbstractIt has been demonstrated that the adhesive wafer bonding technique benefits the fabrication of capacitive micromachined ultrasonic transducers (CMUTs) in the aspects of structural flexibility, CMOS process compatibility, and fabrication yield. Recently, the feasibility of fabricating CMUTs using benzocyclobutene (BCB) based polymer as both the adhesive and structural material was reported. However, the issues of voids at the wafer bonding interface, material deformation and electrode distance control need to be addressed. In this paper, we present an improved fabrication process that allows a void-free device with reduced polymer deformation. The chemical reactions during the BCB curing process were revealed using Fourier transform infrared spectroscopy. Microscopy and cross-sectional SEM images were employed to illustrate the structure improvement in terms of voids and polymer deformation. In addition, an inverse structure that allows an accurate control of the effective electrode distance was presented. The cross-sectional SEM images and the impedance measurement showing the dynamic response of the CMUT demonstrated the feasibility of this inverse structure. The differences between the inverse structure and the conventional structure were also discussed and compared. (C) 2018 Elsevier B.V. All rights reserved.
KeywordCapacitive micromachined ultrasonic transducer Adhesive wafer bonding Photosensitive benzocyclobutene Resonator
DOI10.1016/j.sna.2018.08.036
Language英语
Funding ProjectNatural Sciences and Engineering Research Council of Canada ; CMC Microsystems
WOS Research AreaEngineering ; Instruments & Instrumentation
WOS SubjectEngineering, Electrical & Electronic ; Instruments & Instrumentation
WOS IDWOS:000447476300001
PublisherELSEVIER SCIENCE SA
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.amss.ac.cn/handle/2S8OKBNM/31389
Collection系统科学研究所
Affiliation1.Univ Waterloo, Dept Syst Design Engn, 200 Univ Ave W, Waterloo, ON N2L 3G1, Canada
2.Univ Waterloo, Waterloo Inst Nanotechnol, 200 Univ Ave W, Waterloo, ON N2L 3G1, Canada
3.Chinese Acad Sci, Acad Math & Syst Sci, Key Lab Syst Control, Beijing 100190, Peoples R China
4.Dongguan Univ Technol, Sch Elect Engn & Intelligentizat, Dongguan 523808, Guangdong, Peoples R China
Recommended Citation
GB/T 7714
Li, Zhenhao,Na, Shuai,Chen, Albert I. H.,et al. Optimization on benzocyclobutene-based CMUT fabrication with an inverse structure[J]. SENSORS AND ACTUATORS A-PHYSICAL,2018,281:1-8.
APA Li, Zhenhao.,Na, Shuai.,Chen, Albert I. H..,Wong, Lawrence L. P..,Sun, Zhendong.,...&Yeow, John T. W..(2018).Optimization on benzocyclobutene-based CMUT fabrication with an inverse structure.SENSORS AND ACTUATORS A-PHYSICAL,281,1-8.
MLA Li, Zhenhao,et al."Optimization on benzocyclobutene-based CMUT fabrication with an inverse structure".SENSORS AND ACTUATORS A-PHYSICAL 281(2018):1-8.
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