Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method

doi:10.1117/1.3158611

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	Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method
	Zong, Ke 1; Zeng, Xuan 1; Ji, Xia 2; Cai, Wei 3
	2009-07-01
发表期刊	JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
ISSN	1537-1646
卷号	8 期号:3 页码:13
摘要	We apply a newly developed parallel generalized eigen-oscillation spectral element method (GeSEM) for rigorous simulations of 2-D phase-shift masks (PSMs). The GeSEM combines highly parallel Schwarz-domain decomposition iterations and an eigen-oscillation-based spectral method to model high-frequency oscillatory electromagnetic fields in PSMs with dispersive chrome materials in the PSMs. The performance of the GeSEM has been compared to the popular plane wave-based waveguide method for 2-D masks. The numerical results have clearly demonstrated the GeSEM's advantages in modeling the effects of nonperiodic structures such as optical images near mask edges, and its speedup through parallel implementations, which makes the simulation of a large-scale mask possible in whole-chip mask modeling. (C) 2009 Society of Photo-Optical Instrumentation Engineers. [DOI: 10.1117/1.3158611]
关键词	lithography simulation phase-shifting mask spectral method eigen oscillations discontinuous Galerkin method Schwarz domain decomposition iteration
DOI	10.1117/1.3158611
语种	英语
资助项目	National Basic Research Program of China[2005CB321701] ; National Major Science and Technology[2008ZX01035-001-06] ; National Major Science and Technology[2009ZX020234-3] ; NSFC[60676018] ; NSFC[60806013] ; Ministry of Education of China[200802460068] ; International Science and Technology Cooperation program foundation of Shanghai[08510700100] ; Outstanding Academic Leader of Shanghai ; DARPA[W911NF-05-2-0053] ; State Key laboratory of Scientific and Engineering Computing ; Chinese Academy of Sciences ; U. S. Department of Energy[DEFG0205ER25678]
WOS研究方向	Engineering ; Science & Technology - Other Topics ; Materials Science ; Optics
WOS类目	Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Optics
WOS记录号	WOS:000270881800014
出版者	SPIE-SOC PHOTOPTICAL INSTRUMENTATION ENGINEERS
引用统计
文献类型	期刊论文
条目标识符	http://ir.amss.ac.cn/handle/2S8OKBNM/7513
专题	中国科学院数学与系统科学研究院
通讯作者	Zong, Ke
作者单位	1.Fudan Univ, State Key Lab ASIC & Syst, Microelect Dept, Shanghai 201203, Peoples R China 2.Chinese Acad Sci, Inst Computat Math, Beijing 100190, Peoples R China 3.Univ N Carolina, Dept Math & Stat, Charlotte, NC 28223 USA
推荐引用方式 GB/T 7714	Zong, Ke,Zeng, Xuan,Ji, Xia,et al. Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method[J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,2009,8(3):13.
APA	Zong, Ke,Zeng, Xuan,Ji, Xia,&Cai, Wei.(2009).Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS,8(3),13.
MLA	Zong, Ke,et al."Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method".JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 8.3(2009):13.